
A process used in microfabrication to pattern parts of a thin film or substrate.Lithography is the core patterning technique in microfabrication, used to transfer geometric shapes onto a thin film or substrate. It is the reason modern microchips, sensors, and photonic devices can pack billions of features onto a single chip. The process works by coating a surface with a light-sensitive material (a resist), exposing selected areas to radiation (usually ultraviolet light, but also electron beams or X-rays), and then chemically developing the resist to leave a mask. This mask protects parts of the underlying layer during etching or deposition, so the pattern is physically carved into the material.
The technique evolved from photolithography used in printing and was adapted for semiconductor manufacturing in the late 1950s, notably by Jay Lathrop and James Nall at the U.S. Army's Diamond Ordnance Fuze Laboratories in 1957.
The essential mechanism is selective exposure. A mask or a scanned beam defines which regions of the resist are altered. In optical lithography, light passes through a photomask, projecting a pattern onto the resist; in electron-beam lithography, a focused beam writes the pattern directly. After development, the resist acts as a stencil: areas left exposed are removed or hardened, depending on the resist type. Subsequent steps—etching, ion implantation, or thin-film growth—transfer the pattern into the functional material. The resolution limit is set by the wavelength of the radiation and the optics, which is why advanced methods use extreme ultraviolet light or electron beams.
Lithography is used to fabricate integrated circuits, microelectromechanical systems (MEMS), photonic chips, and even microfluidic channels for lab-on-a-chip devices.
Modern extreme ultraviolet lithography uses light with a wavelength of 13.5 nanometers—about 40 times shorter than visible light—and requires mirrors coated with molybdenum/silicon multilayers because no lens can focus that radiation.


















